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Séminaire LRS | Eleni A. Kyriakidou "High silica small pore zeolites for low temperature CH4 oxidation application"

  • Le 12 Juil. 2024

  • 11:00 - 12:00
  • Séminaire
  • Sorbonne Université - Campus Pierre et Marie Curie
    UFR de Chimie, tour 32-42, salle 101

SÉMINAIRE Personnalité invitée
Titre

HIGH SILICA SMALL PORE ZEOLITES FOR LOW TEMPERATURE CH4 OXYDATION APPLICATION

Présentée par

Eleni A. Kyriakidou

Affectation

University at Buffalo Associate Professor
Department of Chemical and Biological Engineering
School of Engineering and Applied Sciences

Résumé
Natural gas has garnered attention as a cleaner alternative fuel for vehicles compared to gasoline or diesel. The main component of natural gas is methane (CH4) and is 25 times more potent than CO2 in impact to global warming over a 100-year period. The conventional solution for CH4 remediation is its catalytic oxidation using Pd/Al2O3 catalysts.
However, Pd/Al2O3 catalysts suffer from low conversions and deactivation through Pd sintering in typical exhausts of natural gas vehicles containing high amounts of H2O (5–10%) at low temperatures (<400°C). A promising supportalternative is zeolites that can act as molecular sieve through size limiting pores to restrict Pd sintering in the presence of H2O. Specifically, Pd supported on small-pore zeolites achieved higher CH4 oxidation performance compared to zeolites with larger pores. Moreover, the hydrophobicity of zeolites can be increased by increasing the Si content to prevent H2O inhibition. Herein, small-pore LTA and CHA zeolites were synthesized with Si/Al molar ratios > 1 loaded with 1 wt.% Pd and their CH4 oxidation performance was compared with that of 1 wt.% Pd/Al2O3, the state- of-the-art catalyst for CH4 oxidation. The results indicated that an improved CH4 oxidation performance in the presence of H2O can be achieved by increasing the hydrophobicity of Pd/zeolite catalysts. The impact of the zeolite Si/Al molar ratio, hydrothermal durability and sulphur tolerance on the low-temperature oxidation activity, and H2O exposure on Pd speciation at ambient temperure (25°C) and moisture (3.1% H2O), will be discussed
Contact LRS Franck Launay